MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Testing-System-for-Thin-Films
MatMeas-RMS-1000P-Thin-Film-Four-Probe-Sheet-Resistance-Measurement-System
MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Analyzer-for-Thin-Films
MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Measurement-System-for-Thin-Films
MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Testing-System-for-Thin-Films
MatMeas-RMS-1000P-Thin-Film-Four-Probe-Sheet-Resistance-Measurement-System
MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Analyzer-for-Thin-Films
MatMeas-RMS-1000P-Four-Probe-Sheet-Resistance-Measurement-System-for-Thin-Films

RTS-1000P High-Temp Four-Point Probe Resistivity System

RMS-1000P uses four-point probe method for thin film and wafer resistivity measurement, featuring dual-electrostatic measurement, 0.1mฮฉ~100Mฮฉ range, and specialized fixture for semiconductor materials.

  • In-line four-probe method; protects thin-film samples
  • Measures sheet resistance and resistivity (0.1 mฮฉโ€“100 Mฮฉ)
  • Dual electrical-measurement combination for high stability
  • Up to 1100ยฐC anti-oxidation furnace; one-touch lift
  • Multi-atmosphere testing: inert/oxidizing/reducing, vacuum, flowing gas
  • Classic four-point probe design for thin film/wafer measurement

Four-Point Probe Resistivity System Description

RMS-1000P High-Temp Four-Point Probe Resistivity Measurement System is designed for semiconductor thin films and wafer characterization. As an experiencedย semiconductor test equipment factory, we provide precise sheet resistance and resistivity measurement using dual electrostatic method. The system handles silicon, germanium, GaAs, and ITO films with specialized spring-loaded probe fixture, supporting RT-1000ยฐC testing in vacuum or controlled atmospheres forย R&D laboratories and wafer manufacturers.

Four-Point Probe Resistivity Technical Sheet

Parameter Value
Measurement Principle In-line four-probe method; dual electrical-measurement combination
Main Measurement Resistivity & sheet resistance
Range 0.1 mฮฉโ€“100 Mฮฉ
Max Furnace Temperature Up to 1100ยฐC
Atmosphere Inert/oxidizing/reducing; vacuum; flowing atmosphere
Notable Features One-touch lift; thin-film-friendly probe; professional thin-film software
Temperature Range RT-600ยฐC / 1000ยฐC
Temperature Control Accuracy ยฑ0.5ยฐC
Temperature Control Method PID precision control
Heating Rate 0-10ยฐC/min (typical 3ยฐC/min)
Resistance Range 0.1mฮฉ ~ 100Mฮฉ
Resistivity Range 1mฮฉ.cm ~ 10Mฮฉ.cm
Sheet Resistance Range 0.1mฮฉ ~ 100Mฮฉ
Sample Specification Thin film 15-30mm, d<4mm
Measurement Method Four-point probe dual electrostatic
Electrode Material Tungsten carbide / Platinum probes
Needle Insulation Resistance โ‰ฅ1000Mฮฉ
Insulation Material 99% alumina ceramic
Display 10.1″ color touchscreen
Data Interface USB
Communication Interface LAN port
Data Storage TXT format
Dimensions (Lร—Hร—W) 630ร—640ร—450mm
Weight 42.5kg
Power Supply 220Vยฑ10%, 50Hz, 2.6kW
Standards ASTM F84, GB/T1551-2009, GB/T1551-1995

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Four-Point Probe Resistivity Applications

RMS-1000P is specialized for semiconductor thin film characterization including silicon wafers, germanium substrates, GaAs, InSb, GaAsAl, GaAsP, solid solution semiconductors, and ITO conductive glass. Critical forย solar cell manufacturing, LED production, integrated circuit development, and transparent conductive film research.

Four-Point Probe Measurement Video

More Details

Four-Probe Advantage
Classic in-line probe design helps avoid damage to thin-film samples.

Atmosphere Options
Supports inert/oxidizing/reducing atmospheres, vacuum, and flowing gas for temperature-dependent measurements.

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